63.6

Chris A. Mack

Alcon (China)

Chris A. Mack has made significant contributions to the fields of extreme ultraviolet (EUV) lithography, electron beam metrology, and material processing research. Recent studies focus on optimizing EUV patterning for high-numerical aperture imaging, improving single-expose patterning at aggressive pitches, and characterizing stochastic variation in photoresist and line-edge roughness. Mack's work emphasizes the importance of accurate metrology standards, such as the IMEC roughness protocol, to ensure reliable etch performance. Additionally, research on mesoscale modeling, particle generation, and microstructured milling tools explores ways to mitigate tool wear and improve imaging resolution.

Line Edge RoughnessElectron Beam LithographyExtreme Ultraviolet LithographyLaser Voltage ProbingPatterning MaterialsElectrical CharacterizationEnvironmental Scanning Electron MicroscopyRoughness MeasurementTexture Analysis
Commercial signal 63.6
Scientific signal 63.6
Social signal 62.3
Papers 13
4 Patent-to-paper cites
133 Paper cites

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