65.0
Polla Rouf
Linköping University
Polla Rouf's research has significantly contributed to the development of advanced materials for energy-related applications. By fabricating semi-transparent SrTa2N photoanodes with a GaN underlayer grown via atomic layer deposition, they have demonstrated improved efficiency in photoelectrochemical performances. Additionally, their work on thermal ALD of In2O3 thin films using a homoleptic indium triazenide precursor and water has opened up new avenues for precise control over material composition. Rouf's research also explores the synthesis of homogeneous high-ITO content INGa1−xN films via supercycle atomic layer deposition, resolving impurities in ALD-deposited Aluminum Nitride through low-cost precursor design.